Array substrate for liquid crystal display device and method of manufacturing the same

ABSTRACT

An array substrate for a liquid crystal display device includes a substrate including a first driving region, a second driving region, and a pixel region, the pixel region including a switching region and a storage region; a first n-type transistor in the first driving region, a second p-type transistor in the second driving region; a third transistor in the switching region, the third transistor including a gate electrode, an active layer, a source electrode, and a drain electrode; an extension portion in the storage region and extending from the active layer; a metal pattern on the extension portion; a storage line over the metal pattern; and a pixel electrode in the pixel region and contacting the third transistor, wherein the metal pattern, the storage line and the pixel electrode form first, second and third electrodes of a storage capacitor that includes a first capacitor and a second capacitor parallel to each other.

This application claims the benefit of Korean Patent Application No.2004-0061047 filed in Korea on Aug. 3, 2004, which is herebyincorporated by reference in its entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a liquid crystal display device andmore particularly, to an array substrate for a liquid crystal displaydevice and a method of manufacturing the same.

2. Discussion of the Related Art

A liquid crystal display (LCD) device includes an upper substrate, alower substrate and a liquid crystal layer disposed between the upperand lower substrates. The LCD device uses an optical anisotropy ofliquid crystal to produce an image. An electric field is used to controlthe light transmittance of the liquid crystal layer by varying thearrangement of liquid crystal molecules.

One substrate of the LCD device includes a thin film transistor thatacts as a switching element. An LCD device, which includes the thin filmtransistor, is referred to as an active matrix liquid crystal display(AMLCD) device and it has a high resolution and can display an excellentmoving image. Hydrogenated amorphous silicon (a-Si:H) is widely used asan active layer of the thin film transistor because the hydrogenatedamorphous silicon can be formed on a large, low cost substrate such asglass.

However, the hydrogenated amorphous silicon includes weak Si—Si bondsand dangling bonds due to disordered atomic arrangement. Thus, whenlight or an electric field is applied, there may be stability problemsin the hydrogenated amorphous silicon used as the active layer of thethin film transistor. Additionally, the thin film transistor includingthe hydrogenated amorphous silicon has a low field effect mobility ofabout 0.1 to 1.0 cm ²/V·s and is difficult to be used for a driverintegrated circuit (driver IC) that controls the thin film transistor.The driver IC usually includes CMOS (complementarymetal-oxide-semiconductor) transistors that require crystalline siliconas active layers. Because of this, the driver IC is usually connected tothe array substrate using a TAB (tape automated bonding) system. Thisadds significant cost to the LCD device.

To avoid the limitations of amorphous silicon, LCD devices incorporatingpolycrystalline silicon as an active layer are being researched anddeveloped. Polycrystalline silicon is highly beneficial because it ismuch better suited for use in the driver IC than amorphous silicon.Thus, polycrystalline silicon has the advantage that the number offabrication steps could be reduced because a thin film transistor and adriver IC could be formed on the same substrate, eliminating the needfor TAB bonding. Furthermore, the field effect mobility ofpolycrystalline silicon is 100 to 200 times greater than that ofamorphous silicon. Polycrystalline silicon is also optically andthermally stable.

FIG. 1 is a schematic view showing an array substrate of a liquidcrystal display device having driver integrated circuits (driver ICs)according to the related art. Referring to FIG. 1, the array substrateincludes a display region D1 and a non-display region D2 on aninsulating substrate 10. In the display region D1, gate lines GL areformed along a first direction, and data lines DL are formed along asecond direction perpendicular to the first direction. The gate lines GLand the data lines DL cross each other to define pixel regions P. Thepixel regions P form a matrix. In each pixel region P, a switchingelement T and a pixel electrode 78, which is connected to the switchingelement T, are formed. In the non-display region D2, gate and datadriving portions GP and DP are disposed. The gate driving portion GP isdisposed in the left region of the substrate 10 in the context of thefigure, and the data driving portion DP is disposed in the top region ofthe substrate 10 in the context of the figure. The gate driving portionGP, which includes a plurality of driver ICs, supplies an address signalto the gate lines GL, and the data driving portion DP, which alsoincludes a plurality of driver ICs, supplies an image signal to the datalines DL.

The gate driving portion GP and the data driving portion DP areelectrically connected to an outer control circuit (not shown) withsignal input terminals OL which are formed on one edge of the substrate10, so that the outer control circuit (not shown) controls the driverICs of the gate driving portion GP and the data driving portion DP. Theouter control circuit (not shown) applies signals to the gate and datadriving portions GP and DP through the signal input terminals OL.

The gate driving portion GP and the data driving portion DP includedriver ICs having a CMOS (complementary metal-oxide-semiconductor)transistor as an inverter which changes a direct current into analternating current. The CMOS transistor comprises an n-channel MOStransistor (or n-type MOS transistor), in which electrons are themajority carriers, and a p-channel MOS transistor (or p-type MOStransistor), in which holes are the majority carriers. Therefore, in ann-channel MOS transistor, most of the current is carried by negativelycharged electrons, and in a p-channel MOS transistor, most of theconduction is carried by positively charged holes. The thin filmtransistor T of the display region D1 and the CMOS transistor (notshown) of the non-display region D2 may use polycrystalline silicon asan active layer, and thus can be formed on the same substrate 10.

FIG. 2 is a plan view illustrating a pixel region of an array substrateincluding a polycrystalline silicon thin film transistor according tothe related art. Referring to FIG. 2, a gate line GL is formed along adirection on a substrate 10, and a data line DL crosses the gate line GLto define a pixel region P. A thin film transistor T is formed at thecrossing portion of the gate and data lines GL and DL. The thin filmtransistor T includes an active layer 18 of polycrystalline silicon, agate electrode 34 over the active layer 18, and source and drainelectrodes 70 and 72 contacting the active layer 18. A pixel electrode78 is formed in the pixel region P and is connected to the drainelectrode 72. A storage capacitor C_(ST) is also formed in the pixelregion P. The storage capacitor C_(ST) includes an impurity-dopedpolycrystalline silicon pattern 20, as a first electrode, and a storageline 36, as a second electrode. The storage line 36 is disposed over theimpurity-doped polycrystalline silicon pattern 20 and traverses thepixel region P.

FIGS. 3A and 3B are cross-sectional views of an array substrateincluding driver ICs according to the related art. FIG. 3A illustrates aCMOS transistor in a driving region, and FIG. 3B illustrates a pixelregion including a switching element. FIG. 3B corresponds to across-section taken along the line III-III of FIG. 2. Referring to FIGS.3A and 3B, a buffer layer 12 is formed on a substrate 10. A CMOStransistor is formed in a driving region including a first drivingregion A and a second driving region B. The CMOS transistor is composedof an n-type MOS transistor and a p-type MOS transistor in the first andsecond driving regions A and B, respectively. An n-type thin filmtransistor, as a switching element, is formed in a switching region C ofa pixel region P, and a storage capacitor C_(ST) is formed in a storageregion ST of the pixel region P. A pixel electrode 78 is also formed inthe pixel region P and is connected to the n-type thin film transistor.

More particularly, first, second and third active patterns 14, 16 and 18are formed in the first driving region A, the second driving region Band the switching region C, respectively. Each of the first, second andthird active patterns 14, 16 and 18 is formed of polycrystalline siliconand includes an intrinsic portion V1 and doped portions V2. The firstand third active patterns 14 and 18 include a lightly doped drain (LDD)portion F between the intrinsic portion V1 and each doped portion V2.The LDD portion F includes impurities of low density and preventsleakage current of an off-state, that is, applying reverse bias to athin film transistor. An extension portion 20 extends from the thirdactive pattern 18 into the pixel region P.

A gate insulating layer 28 is formed on the entire surface of thesubstrate 10 including the first, second and third active patterns 14,16 and 18. First, second and third gate electrodes 30, 32 and 34 areformed on the gate insulating layer 28. The first, second and third gateelectrodes 30, 32 and 34 correspond to the intrinsic portions of thefirst, second and third active patterns 14, 16 and 18, respectively. Astorage line 36 traversing the pixel region P is also formed on the gateinsulating layer 38. The storage line 36 is disposed over the extensionportion 20. The extension portion 20 and the storage line 36 function asa first electrode and a second electrode, respectively, to form thestorage capacitor C_(ST). An inter insulating layer 48 is formed on theentire surface of the substrate 10 including the first, second and thirdgate electrodes 30, 32 and 34 and the storage line 36. The interinsulating layer 48 and the gate insulating layer 28 include contactholes exposing the doped portions of the first, second and third activepatterns 14, 16 and 18.

First source and drain electrodes 62 and 64, second source and drainelectrodes 66 and 68, and third source and drain electrodes 70 and 72are formed on the inter insulating layer 48. The first source and drainelectrodes 62 and 64 contact the exposed doped portions V2 of the firstactive pattern 14, the second source and drain electrodes 66 and 68contact the exposed doped portions V2 of the second active pattern 16,and the third source and drain electrodes 70 and 72 contact the exposeddoped portions V2 of the third active pattern 18. A pixel electrode 78is formed on a passivation layer 74 in the pixel region P and isconnected to the third drain electrode 72 in the switching region C. Asstated above, the n-type thin film transistor in the switching region Cand the CMOS transistor in the driving region are formed on the samesubstrate through the same processes.

A manufacturing method of an array substrate including driver ICsaccording to the related art will be explained hereinafter withreference to attached drawings.

FIGS. 4A and 4B to FIGS. 12A and 12B are cross-sectional viewsillustrating a manufacturing method of an array substrate includingdriver ICs according to the related art. FIGS. 4B to 12B illustrate apixel region including a switching element and correspond tocross-sections taken along the line III-III of FIG. 2. Referring toFIGS. 4A and 4B, a driving region, which includes a first driving regionA and a second driving region B, and a pixel region P, which includes aswitching region C and a storage region ST, are defined on a substrate10. A buffer layer 12 is formed on the substrate 10 by depositingsilicon oxide (SiO₂).

First, second and third active patterns 14, 16 and 18 are formed on thebuffer layer 12 in the first driving region A, the second driving regionB and the switching region C, respectively, through a first maskprocess. The first, second and third active patterns 14, 16 and 18 areformed of polycrystalline silicon. Each of the first, second and thirdactive patterns 14, 16 and 18 includes an intrinsic portion V1 and dopedportions V2. The first and third active patterns 14 and 18 furtherinclude a lightly doped drain (LDD) portion F between the intrinsicportion V1 and each doped portion V2. An extension portion 20 is alsoformed on the buffer layer 12 in the storage region ST. The extensionportion 20 extends from the third active pattern 18.

In FIGS. 5A and 5B, first, second and third photoresist patterns 22, 24and 26 are formed on the first, second and third active patterns 14, 16and 18, respectively, by coating a photoresist material on the entiresurface of the substrate 10 and then patterning the photoresist materialthrough a second mask process. The extension portion 20 is not coveredwith the photoresist patterns 22, 24 and 26 and is exposed. Next, n⁺ orp⁺ ion doping is performed in the exposed extension portion 20. Thedoped extension portion 20 functions as an electrode for a storagecapacitor. The first, second and third photoresist patterns 22, 24 and26 are removed.

In FIGS. 6A and 6B, a gate insulating layer 28 is formed on thesubstrate 10 including the doped extension portion 20 by depositing aninorganic insulating material such as silicon nitride (SiN_(X)) orsilicon oxide (SiO₂). First, second and third gate electrodes 30, 32 and34 are formed on the gate insulating layer 28 by sequentially depositingand then patterning aluminum (Al) or an aluminum alloy such as AlNdthrough a third mask process. The first, second and third gateelectrodes 30, 32 and 34 correspond to the intrinsic portions of thefirst, second and third active patterns 14, 16 and 18, respectively. Astorage line 36 is also formed on the gate insulating layer 28 over theextension portion 20 in the storage region ST. The extension portion 20and the storage line 36 form a storage capacitor C_(ST) and function asfirst and second electrodes of the storage capacitor C_(ST),respectively. Subsequently, n⁻ ion doping, in which n-type impuritiesare lightly doped, is carried out on the entire surface of the substrate10 including the first, second and third gate electrodes 30, 32 and 34.Thus, n-type ions are lightly doped in the LDD portions F of the firstand third active patterns 14 and 18 and the doped portions V2 of thefirst, second and third active patterns 14, 16 and 18.

In FIGS. 7A and 7B, a photoresist material is coated on the entiresurface of the substrate 10 where n⁻ ion doping is performed and then ispatterned through a fourth mask process, to thereby form fourth, fifthand sixth photoresist patterns 38, 40 and 42. The fourth photoresistpattern 38 covers the first gate electrode 30 and the LDD portions F ofthe first active pattern 14. The fifth photoresist pattern 40 covers thesecond gate electrode 32 and the second active pattern 16. The sixthphotoresist pattern 42 covers the third gate electrode 34 and the LDDportions F of the third active pattern 18. Here, the doped portions V2of the first and third active patterns 14 and 18 are exposed. Next, n⁺ion doping is performed on the entire surface of the substrate 10including the fourth, fifth and sixth photoresist patterns 38, 40 and42. Therefore, n-type ions are heavily doped in the doped portions V2 ofthe first and third active patterns 14 and 18. The fourth, fifth andsixth photoresist patterns 38, 40 and 42 are then removed.

In FIGS. 8A and 8B, a photoresist material is coated on the substrate 10where n⁺ ion doping is performed. Then, the photoresist material ispatterned through a fifth mask process, to thereby form seventh andeighth photoresist patterns 44 and 46. The seventh photoresist pattern44 covers the first gate electrode 30 and the first active pattern 14,and the eighth photoresist pattern 46 covers the third gate electrode 34and the third active pattern 18. The eighth photoresist pattern 46 alsocovers the storage line 36. Subsequently, p⁺ ion doping is performed onthe entire surface of the substrate 10 including the seventh and eighthphotoresist patterns 44 and 46, and p-type ions are heavily doped in thedoped portions V2 of the second active pattern 16. The seventh andeighth photoresist patterns 44 and 46 are then removed.

In FIGS. 9A and 9B, an inter insulating layer 48 is formed on the entiresurface of the substrate 10 where p⁺ ion doping is performed. The interinsulating layer 48 is patterned through a sixth mask process to formfirst, second, third, fourth, fifth and sixth contact holes 50, 52, 54,56, 58 and 60. The first and second contact holes 50 and 52 expose thedoped portions V2 of the first active pattern 14, the third and fourthcontact holes 54 and 56 expose the doped portions V2 of the secondactive pattern 16, and the fifth and sixth contact holes 58 and 60expose the doped portions V2 of the third active pattern 18. The interinsulating layer 48 is formed of silicon oxide (SiO₂).

In FIGS. 10A and 10B, first source and drain electrodes 62 and 64,second source and drain electrodes 66 and 68, and third source and drainelectrodes 70 and 72 are formed on the inter insulating layer 48 bysequentially depositing and then patterning a metallic materialmentioned above through a seventh mask process. The first source anddrain electrodes 62 and 64 contact the doped portions V2 of the firstactive pattern 14 through the first and second contact holes 50 and 52.The second source and drain electrodes 66 and 68 contact the dopedportions V2 of the second active pattern 16 through the third and fourthcontact holes 54 and 56. The third source and drain electrodes 70 and 72contact the doped portions V2 of the third active pattern 18 through thefifth and sixth contact holes 58 and 60.

In FIGS. 11A and 11B, a passivation layer 74 is formed on the entiresurface of the substrate 10 including the source electrodes 62, 66 and70 and the drain electrodes 64, 68 and 72 thereon. The passivation layer74 is patterned through an eighth mask process to thereby form a draincontact hole 76. The drain contact hole 76 exposes the third drainelectrode 72 in the switching region C.

In FIGS. 12A and 12B, a pixel electrode 78 is formed on the passivationlayer 74 in the pixel region P by sequentially depositing and patterninga transparent conductive material through a ninth mask process. Thepixel electrode 78 contacts the third drain electrode 72 through thedrain contact hole 76.

The array substrate of the related art may be fabricated through theabove-mentioned mask processes. However, problems may frequently occurbecause the related art array substrate is fabricated through a largenumber of mask processes, each mask process including several steps,such as cleaning, coating a photoresist layer, exposing through a mask,developing the photoresist layer, and etching. In addition,manufacturing time and costs are increased, and productivity of theprocesses is lowered.

SUMMARY OF THE INVENTION

Accordingly, the present invention is directed to an array substrate fora liquid crystal display device and a method of manufacturing the samethat substantially obviates one or more of problems due to limitationsand disadvantages of the related art.

An object of the present invention is to provide an array substratehaving driver integrated circuits and a method of manufacturing the sameat a low cost.

Another object of the present invention is to provide an array substratehaving driver integrated circuits and a method of manufacturing the sameusing reduced number of processes.

Another object of the present invention is to provide an array substratehaving driver integrated circuits and a method of manufacturing the samethat increase productivity.

Additional features and advantages of the invention will be set forth inthe description which follows, and in part will be apparent from thedescription, or may be learned by practice of the invention. Theobjectives and other advantages of the invention will be realized andattained by the structure particularly pointed out in the writtendescription and claims hereof as well as the appended drawings.

To achieve these and other advantages and in accordance with the purposeof the present invention, as embodied and broadly described, an arraysubstrate for a liquid crystal display device includes a substrateincluding a first driving region, a second driving region, and a pixelregion, the pixel region including a switching region and a storageregion; a first n-type transistor in the first driving region, a secondp-type transistor in the second driving region; a third transistor inthe switching region, the third transistor including a gate electrode,an active layer, a source electrode, and a drain electrode; an extensionportion in the storage region and extending from the active layer; ametal pattern on the extension portion; a storage line over the metalpattern; and a pixel electrode in the pixel region and contacting thethird transistor, wherein the metal pattern, the storage line and thepixel electrode form first, second and third electrodes of a storagecapacitor, and wherein the storage capacitor includes a first capacitorand a second capacitor, the first capacitor parallel to the secondcapacitor.

In another aspect, a method of manufacturing a liquid crystal displaydevice includes forming first, second and third active patterns, anextension portion and a metal pattern on a substrate using a first mask,the substrate having a driving region and a pixel region, the first andsecond active patterns disposed in first and second driving regions ofthe driving region, the third active pattern disposed in a switchingregion of the pixel region, and the extension portion and the metalpattern disposed in a storage region of the pixel region; forming a gateinsulating layer on the substrate including the first, second and thirdactive patterns, the extension portion and the metal pattern; formingfirst, second and third gate electrodes and a storage line on the gateinsulating layer using a second mask, the first, second and third gateelectrodes corresponding to center portions of the first, second andthird active patterns, and the storage line disposed over the metalpattern; sequentially doping n⁺ ions and n⁻ ions in the first and thirdactive patterns using a third mask; doping p⁺ ions into the secondactive pattern using a fourth mask; forming an inter insulating layerand a transparent conductive layer on the substrate including the p⁺ iondoped second active pattern; patterning the inter insulating layer andthe transparent conductive layer using a fifth mask to thereby exposeportions of the first, second and third active patterns and to form apixel electrode in the pixel region; and forming first source and drainelectrodes, second source and drain electrodes and third source anddrain electrodes using a sixth mask, the first source and drainelectrodes contacting the exposed portions of the first active pattern,the second source and drain electrodes contacting the exposed portionsof the second active pattern, and the third source and drain electrodescontacting the exposed portions of the third active pattern.

In another aspect, a method of manufacturing a liquid crystal displaydevice includes forming first, second and third active patterns, anextension portion and a metal pattern on a substrate using a first mask,the substrate having a first driving region, a second driving region,and a pixel region including a switching region and a storage region,the first and second active patterns disposed in the first and seconddriving regions, the third active pattern disposed in the switchingregion, and the extension portion and the metal pattern disposed in thestorage region; forming a gate insulating layer on the substrateincluding the first, second and third active patterns, the extensionportion and the metal pattern; doping n⁺ ions and n⁻ ions in the firstand third active patterns and then forming first, second and third gateelectrodes and a storage line on the gate insulating layer using asecond mask, the first, second and third gate electrodes correspondingto center portions of the first, second and third active patterns, thestorage line disposed over the metal pattern; doping p⁺ ions into thesecond active pattern using a third mask; forming an inter insulatinglayer and a transparent conductive layer on the substrate including thep⁺ ion doped second active pattern; patterning the inter insulatinglayer and the transparent conductive layer using a fourth mask to exposeportions of the first, second and third active patterns and to form apixel electrode in the pixel region; and forming first source and drainelectrodes, second source and drain electrodes, and third source anddrain electrodes using a fifth mask, the first source and drainelectrodes contacting the exposed portions of the first active pattern,the second source and drain electrodes contacting the exposed portionsof the second active pattern, the third source and drain electrodescontacting the exposed portions of the third active pattern.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and areintended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification, illustrate embodiments of the invention andtogether with the description serve to explain the principles of theinvention.

FIG. 1 is a schematic view showing an array substrate of a liquidcrystal display device having driver integrated circuits according tothe related art.

FIG. 2 is a plan view illustrating a pixel region of an array substrateincluding a polycrystalline silicon thin film transistor according tothe related art.

FIGS. 3A and 3B are cross-sectional views of an array substrateincluding driver ICs according to the related art.

FIGS. 4A and 4B to FIGS. 12A and 12B are cross-sectional viewsillustrating a manufacturing method of an array substrate includingdriver ICs according to the related art.

FIG. 13 is a plan view of an exemplary pixel region of an arraysubstrate including a polycrystalline silicon thin film transistoraccording to an embodiment of the present invention.

FIG. 14A is a cross-sectional view illustrating the formation of a metallayer in a driving region of the array substrate of FIG. 13 using afirst mask process in accordance with an embodiment of the presentinvention.

FIG. 14B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a metal layer in a pixel region of thearray substrate of FIG. 13 during the first mask process.

FIG. 15A is a cross-sectional view of the formation of a photoresistpattern in a driving region of the array substrate of FIG. 13 during thefirst mask process.

FIG. 15B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a photoresist pattern in a pixel region ofthe array substrate of FIG. 13 during the first mask process.

FIG. 16A is a cross-sectional view of the formation of a metal patternin a driving region of the array substrate of FIG. 13 during the firstmask process.

FIG. 16B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a metal pattern in a pixel region of thearray substrate of FIG. 13 during the first mask process.

FIG. 17A is a cross-sectional view of an ashing of a photoresist patternin a driving region of the array substrate of FIG. 13 during the firstmask process.

FIG. 17B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating an ashing of a photoresist pattern in a pixel region of thearray substrate of FIG. 13 during the first mask process.

FIG. 18A is a cross-sectional view of the formation of a gate insulatinglayer in a driving region of the array substrate of FIG. 13 followingthe first mask process.

FIG. 18B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a gate insulating layer in a pixel regionof the array substrate of FIG. 13 following the first mask process.

FIG. 19A is a cross-sectional view of the formation of a plurality ofelectrodes in a driving region of the array substrate of FIG. 13 duringa second mask process.

FIG. 19B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of an electrode and a storage line in a pixelregion of the array substrate of FIG. 13 during the second mask process.

FIG. 20A is a cross-sectional view of the formation of a photoresistpattern in a driving region of the array substrate of FIG. 13 during athird mask process.

FIG. 20B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a photoresist pattern in a pixel region ofthe array substrate of FIG. 13 during the third mask process.

FIG. 21A is a cross-sectional view showing an ion doping of a drivingregion of the array substrate of FIG. 13 during a third mask process.

FIG. 21B is a cross-sectional view along line XIV-XIV of FIG. 13 showingan ion doping of a pixel region of the array substrate of FIG. 13 duringthe third mask process.

FIG. 22A is a cross-sectional view of the formation of a photoresistpattern in a driving region of the array substrate of FIG. 13 during afourth mask process.

FIG. 22B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a photoresist pattern in a pixel region ofthe array substrate of FIG. 13 during the fourth mask process.

FIGS. 23A and 24A are cross-sectional views of the formation of aphotoresist pattern in a driving region of the array substrate of FIG.13 during a fifth mask process.

FIGS. 23B and 24B are cross-sectional views along line XIV-XIV of FIG.13 illustrating the formation of a photoresist pattern in a pixel regionof the array substrate of FIG. 13 during the fifth mask process.

FIG. 25A is a cross-sectional view of the formation of a plurality ofcontact holes in a driving region of the array substrate of FIG. 13during the fifth mask process.

FIG. 25B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a plurality of contact holes in a pixelregion of the array substrate of FIG. 13 during the fifth mask process.

FIG. 26A is a cross-sectional view of an ashing process performed in adriving region of the array substrate of FIG. 13 during the fifth maskprocess.

FIG. 26B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating an ashing process performed in a pixel region of the arraysubstrate of FIG. 13 during the fifth mask process.

FIG. 27A is a cross-sectional view of the formation of a plurality ofelectrodes in a driving region of the array substrate of FIG. 13 duringa sixth mask process.

FIG. 27B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a plurality of electrodes in a pixelregion of the array substrate of FIG. 13 during the sixth mask process.

FIGS. 28A and 28B to FIGS. 41A and 41B are cross-sectional viewsillustrating a manufacturing method of an array substrate includingdriver ICs according to another embodiment of the present invention.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

Reference will now be made in detail to the illustrated exemplaryembodiments of the present invention, which are illustrated in theaccompanying drawings.

FIG. 13 is a plan view of an exemplary pixel region of an arraysubstrate including a polycrystalline silicon thin film transistoraccording to an embodiment of the present invention. Referring to FIG.13, one or more gate line GL is formed along a first direction on asubstrate. One or more data line DL is formed on the substrate along asecond direction perpendicular to the first direction. The one or moregate line GL and the one or more data line DL cross each other to definea pixel region P.

A thin film transistor T is formed at the crossing portion of the gateand data lines GL and DL. The thin film transistor T includes an activelayer 118 of polycrystalline silicon, a gate electrode 130 over theactive layer 118, and source and drain electrodes 150 a and 150 bcontacting the active layer 118. A pixel electrode 140 is formed in thepixel region P and is connected to the drain electrode 150 b.

A storage capacitor C^(ST) is also formed in the pixel region P. Thestorage capacitor C^(ST) includes two parallel capacitors. The first ofthe two parallel capacitors is formed by a metal pattern 122 and astorage line 132. The second of the two parallel capacitors is formed bythe storage line 132 and the pixel electrode 140. The metal pattern 122is disposed on an extension portion (not shown) extending from theactive layer 118 and is electrically connected to the drain electrode150 b. The storage line 132 overlaps the metal pattern 122. The pixelelectrode 140 overlaps the storage line 132 and is connected the drainelectrode 150 b. Hereinafter, a method of manufacturing an arraysubstrate including driver integrated circuits (ICs) according to anembodiment of the present invention will be explained with reference toattached drawings.

FIG. 14A is a cross-sectional view illustrating the formation of a metallayer in a driving region of the array substrate of FIG. 13 using afirst mask process in accordance with an embodiment of the presentinvention. FIG. 14B is a cross-sectional view along line XIV-XIV of FIG.13 illustrating the formation of a metal layer in a pixel region of thearray substrate of FIG. 13 during the first mask process. Referring toFIG. 14A, a first driving region A and a second driving region B aredefined on a substrate 100. Referring to FIG. 14B, a pixel region P,which includes a switching region C and a storage region ST, is definedon the substrate 100. A buffer layer 102 is formed on the substrate 100,including the first and second driving regions A and B, and the pixelregion P, by depositing, for example, silicon nitride (SiN_(X)) orsilicon oxide (SiO₂). A polycrystalline silicon layer 104 and a metallayer 106 are formed on the buffer layer 102. The polycrystallinesilicon layer 104 may be formed by sequentially depositing,dehydrogenating, and crystallizing amorphous silicon (a-Si:H).

Next, a photoresist layer 108 is formed on the metal layer 106 bycoating a photoresist material. A mask M1 is disposed over thephotoresist layer 108. The mask M1 includes a transmitting portion E1, ablocking portion E2 and a half transmitting portion E3. The halftransmitting portion E3 may include a semitransparent film or slits. Thehalf transmitting portion E3 corresponds to the first driving region A,the second driving region B and the switching region C. The blockingportion E2 corresponds to the storage region ST, and the transmittingportion E1 corresponds to the other regions. The photoresist layer 108is exposed to light through the mask M1. Then, the photoresist layer 108is developed.

FIG. 15A is a cross-sectional view of the formation of a photoresistpattern in a driving region of the array substrate of FIG. 13 during thefirst mask process. FIG. 15B is a cross-sectional view along lineXIV-XIV of FIG. 13 illustrating the formation of a photoresist patternin a pixel region of the array substrate of FIG. 13 during the firstmask process. Referring to FIGS. 15A and 15B, first, second, third andfourth photoresist patterns 110 a, 110 b, 110 c and 112 are formed. Thefirst, second, and third photoresist patterns 110 a, 110 b and 110 c areformed in the first driving region A, the second driving region B andthe switching region C, respectively. The first, second, and thirdphotoresist patterns 110 a, 110 b and 110 c have a first thickness. Thefourth photoresist pattern 112 is formed in the storage region ST and isthicker than the first to third photoresist patterns 110 a, 10 b and 110c. The first to fourth photoresist patterns 110 a, 110 b, 110 c, and 112expose portions of the metal layer 106 in the pixel region P and thefirst and second driving regions A and B.

FIG. 16A is a cross-sectional view of the formation of a metal patternin a driving region of the array substrate of FIG. 13 during the firstmask process. FIG. 16B is a cross-sectional view along line XIV-XIV ofFIG. 13 illustrating the formation of a metal pattern in a pixel regionof the array substrate of FIG. 13 during the first mask process.Referring to FIGS. 16A and 16B, the exposed portions of the metal layer106 and the polycrystalline silicon layer 104 thereunder are removed.The metal layer 106 may be removed by a wet etch method. Thepolycrystalline silicon layer 104 may be removed by a dry etch method.The remaining pattern on the buffer layer 102 in the first drivingregion A includes a polycrystalline silicon patterned layer 114, themetal patterned layer 106, and the photoresist pattern 110 a in stackingorder. The remaining pattern on the buffer layer 102 in the seconddriving region B includes a polycrystalline silicon patterned layer 116,a metal patterned layer 106, and the photoresist pattern 110 b instacking order. The remaining pattern on the buffer layer 102 in theswitching region C of the pixel region P includes a polycrystallinesilicon patterned layer 118, the metal patterned layer 106, and thephotoresist pattern 110 c in stacking order. The remaining pattern onthe buffer layer 102 in the storage region ST of the pixel region Pincludes a polycrystalline silicon patterned layer 120, the metalpatterned layer 122, and the photoresist pattern 112 in stacking order.

FIG. 17A is a cross-sectional view of an ashing process of a photoresistpattern in a driving region of the array substrate of FIG. 13 during thefirst mask process. FIG. 17B is a cross-sectional view along lineXIV-XIV of FIG. 13 illustrating an ashing of a photoresist pattern in apixel region of the array substrate of FIG. 13 during the first maskprocess. Referring to FIGS. 17A and 17B, an ashing process is performed.The first, second and third photoresist patterns 110 a, 110 b and 110 cshown in FIGS. 16A and 16B are removed by the ashing process, therebyexposing the metal layer 106 in the first driving region A, the seconddriving region B and the switching region C. The thickness of the fourthphotoresist pattern 112 is also reduced by the ashing process.

FIG. 18A is a cross-sectional view of the formation of a gate insulatinglayer in a driving region of the array substrate of FIG. 13 followingthe first mask process. FIG. 18B is a cross-sectional view along lineXIV-XIV of FIG. 13 illustrating the formation of a gate insulating layerin a pixel region of the array substrate of FIG. 13 following the firstmask process. Referring to FIGS. 18A and 18B, the exposed metal layer106 is removed from the first and second driving regions A and B and theswitching region C, and the fourth photoresist pattern 112 is removedfrom the storage region ST. First, second, and third active patterns114, 116, and 118 are formed on the buffer layer 102 in the firstdriving region A, the second driving region B, and the switching regionC, respectively. An extension portion 120 and a metal pattern 122 areformed on the buffer layer 102 in the storage region ST. The extensionportion 120 extends from the third active pattern 118, and the metalpattern 122 is disposed on the extension portion 120. Each of the first,second and third active patterns 114, 116 and 118 includes an intrinsicportion V1 and doped portions V2 at both sides of the intrinsic portionV1. The first and third active patterns 114 and 118 further include alightly doped drain (LDD) portion F between the intrinsic portion V1 andeach doped portion V2. Then, a gate insulating layer 124 is formed onthe entire surface of the substrate 100 covering the first, second andthird active patterns 114, 116 and 118, the extension portion 120 andthe metal pattern 122 thereon. The gate insulating layer 124 may beformed of an inorganic insulating material such as silicon nitride(SiN_(X)) or silicon oxide (SiO₂).

FIG. 19A is a cross-sectional view of the formation of a plurality ofelectrodes in a driving region of the array substrate of FIG. 13 duringa second mask process. FIG. 19B is a cross-sectional view along lineXIV-XIV of FIG. 13 illustrating the formation of an electrode and astorage line in a pixel region of the array substrate of FIG. 13 duringthe second mask process. Referring to FIGS. 19A and 19B, first, secondand third gate electrodes 126, 128 and 130 and a storage line 132 areformed on the gate insulating layer 124 by sequentially depositing andpatterning a metallic material through a second mask process. Themetallic material may include aluminum (Al), an aluminum alloy (AlNd),copper (Cu), molybdenum (Mo), tungsten (W) or chromium (Cr). The first,second and third gate electrodes 126, 128 and 130 correspond to theintrinsic portions V1 of the first, second and third active patterns114, 116 and 118, respectively. The storage line 132 is disposed overthe metal pattern 122 in the storage region ST. As shown in FIG. 13, thestorage line 132 crosses the pixel region P. Concurrently, a gate lineGL (shown in FIG. 13) is formed and is connected to the third gateelectrode 130 in the switching region C.

FIG. 20A is a cross-sectional view of the formation of a photoresistpattern in a driving region of the array substrate of FIG. 13 during athird mask process. FIG. 20B is a cross-sectional view along lineXIV-XIV of FIG. 13 illustrating the formation of a photoresist patternin a pixel region of the array substrate of FIG. 13 during the thirdmask process. Referring to FIGS. 20A and 20B, a photoresist material iscoated on the entire surface of the substrate 100 to cover the first,second and third gate electrodes 126, 128 and 130 and the storage line132. Then, the photoresist material is patterned through a third maskprocess to form fifth, sixth and seventh photoresist patterns 134 a, 134b and 134 c. The fifth photoresist pattern 134 a covers the first gateelectrode 126 and the LDD portions F of the first active pattern 114.The sixth photoresist pattern 134 b covers the third gate electrode 130and the LDD portions F of the third active pattern 118. The seventhphotoresist pattern 134 c covers the second gate electrode 128 and thesecond active pattern 116. Here, the doped portions V2 of the first andthird active patterns 114 and 118 are exposed. In this embodiment of thepresent invention, no resist pattern is formed in the pixel region Pexcluding the switching region C. In another embodiment of the presentinvention, another photoresist pattern may be formed in the pixel regionP excluding the switching region C. Next, n⁺ ion doping is performed onthe entire surface of the substrate 100, including the fifth, sixth andseventh photoresist patterns 134 a, 134 b and 134 c. Therefore, n-typeions are heavily doped in the doped portions V2 of the first and thirdactive patterns 114 and 118.

FIG. 21A is a cross-sectional view showing an ion doping of a drivingregion of the array substrate of FIG. 13 during a third mask process.FIG. 21B is a cross-sectional view along line XIV-XIV of FIG. 13 showingan ion doping of a pixel region of the array substrate of FIG. 13 duringthe third mask process. Referring to FIGS. 21A and 21B, the fifth, sixthand seventh photoresist patterns 134 a, 134 b and 134 c are removed, andthe first, second and third gate electrodes 126, 128 and 130 areexposed. N⁻ ion doping is carried out on the entire surface of thesubstrate 100 where n⁺ doping was performed. Here, the first, second andthird gate electrodes 126, 128 and 130 are used as a doping mask. Thus,the LDD portions F of the first and third active patterns 114 and 118and the doped portions V2 of the first, second and third active patterns114, 116 and 118 are lightly doped with n-type ions. The doped portionsV2 of the first and third active patterns 114 and 118 are heavily dopedwith n-type ions, because the n⁻ ion doping process doped more n-typeions in the doped portions V2 of the first and third active patterns 114and 118.

FIG. 22A is a cross-sectional view of the formation of a photoresistpattern in a driving region of the array substrate of FIG. 13 during afourth mask process. FIG. 22B is a cross-sectional view along lineXIV-XIV of FIG. 13 illustrating the formation of a photoresist patternin a pixel region of the array substrate of FIG. 13 during the fourthmask process. Referring to FIGS. 22A and 22B, a photoresist material iscoated on the entire surface of the substrate 100 where n⁻ ion dopingwas performed. The photoresist material is patterned through a fourthmask process to form an eighth photoresist pattern 136. The eighthphotoresist pattern 136 covers the first driving region A and the pixelregion P and exposes the second driving region B.

Subsequently, p⁺ ion doping is performed on the entire surface of thesubstrate 100 including the eighth photoresist pattern 136 thereon, andp-type ions are heavily doped in the doped portions V2 of the secondactive pattern 116. Although the n-type ions are doped in the dopedportions V2 of the second active pattern 116, there is no influence ofthe n-type ions because the concentration of the p-type ions isextremely high compared to the n-type ions.

FIGS. 23A and 24A are cross-sectional views of the formation of aphotoresist pattern in a driving region of the array substrate of FIG.13 during a fifth mask process. FIGS. 23B and 24B are cross-sectionalviews along line XIV-XIV of FIG. 13 illustrating the formation of aphotoresist pattern in a pixel region of the array substrate of FIG. 13during the fifth mask process. Referring to FIGS. 23A and 23B, theeighth photoresist pattern 136 shown in FIGS. 22A and 22B is removed. Aninter insulating layer 138 and a transparent conductive layer 140 aresequentially formed on the entire surface of the substrate 100 where p⁺ion doping is performed, including the first, second and third gateelectrodes 126, 128 and 130, and the storage line 132. The interinsulating layer 138 is formed of an inorganic insulating material, suchas silicon nitride (SiN_(X)) or silicon oxide (SiO₂). The transparentconductive layer 140 is formed of a transparent conductive material,such as indium tin oxide (ITO) or indium zinc oxide (IZO).

A photoresist layer 142 is formed on the transparent conductive layer140 by coating a photoresist material. A mask M2 is disposed over thephotoresist layer 142. The mask M2 includes a transmitting portion H1, ablocking portion H2 and a half transmitting portion H3. The transmittingportion H1 corresponds to the doped portions V2 of the first, second andthird active patterns 114, 116 and 118. The blocking portion H2corresponds to the pixel region P, and the half transmitting portion H3corresponds to the other regions. The photoresist layer 142 is exposedto light through the mask M2 and developed. Accordingly, as illustratedin FIGS. 24A and 24B, ninth and tenth photoresist patterns 144 a and 144b are formed. The ninth photoresist pattern 144 a is disposed in thefirst driving region A, the second driving region B, and the switchingregion C, and exposes portions of the transparent conductive layer 140corresponding to the doped portions V2 of the first, second and thirdactive patterns 114, 116 and 118. The tenth photoresist pattern 144 b isdisposed in the pixel region P excluding the switching region C. Thetenth photoresist pattern 144 b is thicker than the ninth photoresistpattern 144 a.

FIG. 25A is a cross-sectional view of the formation of a plurality ofcontact holes in a driving region of the array substrate of FIG. 13during the fifth mask process.

FIG. 25B is a cross-sectional view along line XIV-XIV of FIG. 13illustrating the formation of a plurality of contact holes in a pixelregion of the array substrate of FIG. 13 during the fifth mask process.Referring to FIGS. 25A and 25B, the exposed portions of the transparentconductive layer 140, and the inter insulating layer 138 and the gateinsulating layer 124 underneath, are sequentially removed. Thereby,first, second, third, fourth, fifth and sixth contact holes 145 a, 145b, 145 c, 145 d, 145 e and 145 f are formed. The contact holes 145 a,145 b, 145 c, 145 d, 145 e and 145 f expose the doped portions V2 of thefirst, second and third active patterns 114, 116 and 118. Although notshown, a contact hole is also formed through the fifth mask process toexpose the metal pattern 122.

FIG. 26A is a cross-sectional view of an ashing process performed in adriving region of the array substrate of FIG. 13 during the fifth maskprocess. FIG. 26B is a cross-sectional view along line XIV-XIV of FIG.13 illustrating an ashing process performed in a pixel region of thearray substrate of FIG. 13 during the fifth mask process. Referring toFIGS. 26A and 26B, the ninth photoresist pattern 144 a of FIGS. 25A and25B is removed through an ashing process, and the transparent conductivelayer 140 of FIGS. 25A and 25B is exposed in the first driving region A,the second driving region B and the switching region C. The thickness ofthe tenth photoresist pattern 144 b is reduced, and an edge of the tenthphotoresist pattern 144 b is removed. Then, the exposed transparentconductive layer 140 of FIGS. 25A and 25B is removed to thereby exposethe inter insulating layer 138 in the first driving region A, the seconddriving region B and the switching region C.

FIG. 27A is a cross-sectional view of the formation of a plurality ofelectrodes in a driving region of the array substrate of FIG. 13 duringa sixth mask process. FIG. 27B is a cross-sectional view along lineXIV-XIV of FIG. 13 illustrating the formation of a plurality ofelectrodes in a pixel region of the array substrate of FIG. 13 duringthe sixth mask process. Referring to FIGS. 27A and 27B, the tenthphotoresist pattern 144 b (shown in FIG. 26B) is removed, exposing thetransparent conductive layer 140 in the pixel region P. The exposedtransparent conductive layer 140 becomes a pixel electrode 140. Firstsource and drain electrodes 146 a and 146 b, second source and drainelectrodes 148 a and 148 b, and third source and drain electrodes 150 aand 150 b are formed on the substrate 100 including the pixel electrode140 thereon by sequentially depositing and patterning a metallicmaterial through a sixth mask process. The metallic material can be, forexample, chromium (Cr), molybdenum (Mo), tungsten (W), titanium (Ti),aluminum (Al), an aluminum alloy such as AlNd, or copper (Cu).

The first source and drain electrodes 146 a and 146 b contact the dopedportions V2 of the first active pattern 114 through the first and secondcontact holes 145 a and 145 b, respectively. The second source and drainelectrodes 148 a and 148 b contact the doped portions V2 of the secondactive pattern 116 through the third and fourth contact holes 145 c and145 d, respectively. The third source and drain electrodes 150 a and 150b contact the doped portions V2 of the third active pattern 118 throughthe fifth and sixth contact holes 145 e and 145 f, respectively. Thethird drain electrode 150 b contacts the pixel electrode 140. Althoughnot shown, the third drain electrode 150 b also contacts the metalpattern 122. Thus, the metal pattern 122, the storage line 132 and thepixel electrode 140 function as first, second and third electrodes toform a storage capacitor C_(ST). In this embodiment of the presentinvention, the storage capacitor C_(ST) includes two parallelcapacitors. In this embodiment of the present invention, the arraysubstrate including the driver ICs is manufactured through six-maskprocesses.

FIG. 28A is a cross-sectional view illustrating the formation of a metallayer in a driving region of an array substrate using a first maskprocess in accordance with another embodiment of the present invention.FIG. 28B is a cross-sectional view illustrating the formation of a metallayer in a pixel region of the array substrate of FIG. 13 during thefirst mask process. Referring to FIG. 28A, a first driving region A anda second driving region B are defined on a substrate 200. Referring toFIG. 28B, a pixel region P, which includes a switching region C and astorage region ST, is defined on the substrate 200. A buffer layer 202is formed on the substrate 200, including the first and second drivingregions A and B, and the pixel region P, by depositing, for example,silicon nitride (SiN_(X)) or silicon oxide (SiO₂). A polycrystallinesilicon layer 204 and a metal layer 206 are formed on the buffer layer202. The polycrystalline silicon layer 204 may be formed by sequentiallydepositing, dehydrogenating, and crystallizing amorphous silicon(a-Si:H).

Next, a photoresist layer 208 is formed on the metal layer 206 bycoating a photoresist material. A mask M1 is disposed over thephotoresist layer 208. The mask M1 includes a transmitting portion E1, ablocking portion E2 and a half transmitting portion E3. The halftransmitting portion E3 may include a semitransparent film or slits. Thehalf transmitting portion E3 corresponds to the first driving region A,the second driving region B and the switching region C. The blockingportion E2 corresponds to the storage region ST, and the transmittingportion E1 corresponds to the other regions. The photoresist layer 208is exposed to light through the mask M1. Then, the photoresist layer 208is developed.

FIG. 29A is a cross-sectional view of the formation of a photoresistpattern in a driving region of an array substrate during the first maskprocess. FIG. 29B is a cross-sectional view illustrating the formationof a photoresist pattern in a pixel region of the array substrate duringthe first mask process. Referring to FIGS. 29A and 29B, first, second,third and fourth photoresist patterns 210 a, 210 b, 210 c and 212 areformed. The first, second, and third photoresist patterns 210 a, 210 band 210 c are formed in the first driving region A, the second drivingregion B and the switching region C, respectively. The first, second,and third photoresist patterns 210 a, 210 b and 210 c have a firstthickness. The fourth photoresist pattern 212 is formed in the storageregion ST and is thicker than the first to third photoresist patterns210 a, 210 b and 210 c. The first to fourth photoresist patterns 210 a,210 b, 210 c, and 212 expose portions of the metal layer 206 in thepixel region P and the first and second driving regions A and B.

FIG. 30A is a cross-sectional view of the formation of a metal patternin a driving region of an array substrate during the first mask process.FIG. 30B is a cross-sectional view illustrating the formation of a metalpattern in a pixel region of the array substrate of FIG. 13 during thefirst mask process. Referring to FIGS. 30A and 30B, the exposed portionsof the metal layer 206 and the polycrystalline silicon layer 204thereunder are removed. The metal layer 206 may be removed by a wet etchmethod. The polycrystalline silicon layer 204 may be removed by a dryetch method. The remaining pattern on the buffer layer 202 in the firstdriving region A includes a polycrystalline silicon patterned layer 214,a metal patterned layer 206, and the photoresist pattern 210 a instacking order. The remaining pattern on the buffer layer 202 in thesecond driving region B includes a polycrystalline silicon patternedlayer 216, a metal patterned layer 206, and the photoresist pattern 210b in stacking order. The remaining pattern on the buffer layer 202 inthe switching region C of the pixel region includes a polycrystallinesilicon patterned layer 218, a metal patterned layer 206, and thephotoresist pattern 210 c in stacking order. The remaining pattern onthe buffer layer 202 in the storage region ST of the pixel regionincludes a polycrystalline silicon patterned layer 220, a metalpatterned layer 222, and the photoresist pattern 212 in stacking order.

FIG. 31A is a cross-sectional view of an ashing of a photoresist patternin a driving region of an array substrate during the first mask process.FIG. 31B is a cross-sectional view illustrating an ashing of aphotoresist pattern in a pixel region of the array substrate of FIG. 13during the first mask process. Referring to FIGS. 31A and 31B, an ashingprocess is performed. The first, second and third photoresist patterns210 a, 210 b and 210 c from FIGS. 30A and 30B are removed by the ashingprocess, thereby exposing the metal layer 206 in the first drivingregion A, the second driving region B and the switching region C. Thethickness of the fourth photoresist pattern 212 is also reduced by theashing process.

FIG. 32A is a cross-sectional view of the formation of a gate insulatinglayer in a driving region of an array substrate following the first maskprocess. FIG. 32B is a cross-sectional view illustrating the formationof a gate insulating layer in a pixel region of the array substrate ofFIG. 13 following the first mask process. Referring to FIGS. 32A and32B, the exposed metal layer 206 is removed from the first and seconddriving regions A and B and the switching region C, and the fourthphotoresist pattern 212 is removed from the storage region ST. First,second, and third active patterns 214, 216, and 218 are formed on thebuffer layer 202 in the first driving region A, the second drivingregion B, and the switching region C, respectively. An extension portion220 and a metal pattern 222 are formed on the buffer layer 202 in thestorage region ST. The extension portion 220 extends from the thirdactive pattern 218, and the metal pattern 222 is disposed on theextension portion 220. Each of the first, second and third activepatterns 214, 216 and 218 includes an intrinsic portion V1 and dopedportions V2 at both sides of the intrinsic portion V1. The first andthird active patterns 214 and 218 further include a lightly doped drain(LDD) portion F between the intrinsic portion V1 and each doped portionV2. Then, a gate insulating layer 224 is formed on the entire surface ofthe substrate 200 covering the first, second and third active patterns214, 216 and 218, the extension portion 220 and the metal pattern 222thereon. The gate insulating layer 224 may be formed of an inorganicinsulating material such as silicon nitride (SiN_(X)) or silicon oxide(SiO₂).

FIG. 33A is a cross-sectional view of the formation of a plurality ofelectrodes in a driving region of an array substrate during a secondmask process. FIG. 33B is a cross-sectional view illustrating theformation of an electrode and a storage line in a pixel region of thearray substrate during the second mask process. Referring to FIGS. 33Aand 33B, a metallic material (not shown) is deposited on the gateinsulating layer 224. Next, photoresist is coated on the metallicmaterial and then is patterned through a second mask process to therebyform fifth, sixth, seventh and eighth photoresist patterns 225 a, 225 b,225 c and 225 d. The metallic material is etched by using the fifth,sixth, seventh and eighth photoresist patterns 225 a, 225 b, 225 c and225 d. Thus, first, second and third gate electrodes 226, 228 and 230and a storage line 232 are formed on the gate insulating layer 224. Themetallic material may include aluminum (Al), an aluminum alloy (AlNd),copper (Cu), molybdenum (Mo), tungsten (W) or chromium (Cr). The first,second and third gate electrodes 226, 228 and 230 correspond to theintrinsic portions V1 of the first, second and third active patterns214, 216 and 218, respectively. The first and third gate electrodes 226and 230 also cover the LDD portions F of the first and third activepatterns 214 and 218. The second gate electrode 228 partially covers thedoped portions V2 of the second active pattern 216. The storage line 232is disposed over the metal pattern 222 in the storage region ST. Thestorage line 232 may cross the pixel region P similarly to the storageline 132 in FIG. 13. Concurrently, a gate line GL (shown in FIG. 13) isformed and is connected to the third gate electrode 230 in the switchingregion C.

Next, n⁺ ion doping is performed on the entire surface of the substrate200 including the fifth, sixth, seventh and eighth photoresist patterns225 a, 225 b, 225 c and 225 d. Therefore, n-type ions are heavily dopedin the doped portions V2 of the first and third active patterns 214 and218 and in parts of the doped portions V2 of the second active pattern216.

Referring to FIGS. 34A and 34B, the fifth and seventh photoresistpatterns 225 a and 225 c are partially removed by performing an ashingprocess such that peripheral portions of the first and third gateelectrodes 226 and 230 corresponding to the LDD portions F of the firstand third active patterns 214 and 218 are exposed. At this time, thesixth and eighth photoresist patterns 225 b and 225 d are also removed,and peripheral portions of the second gate electrode 228 and the storageline 232 are exposed. The exposed peripheral portions of the second gateelectrode 228 and the storage line 232 have the same width as theexposed portions of the first and third gate electrodes 226 and 230.

Referring to FIGS. 35A and 35B, the exposed peripheral portions of thefirst, second and third gate electrodes 226, 228 and 230 and the storageline 232 of FIGS. 34A and 34B are removed. Thus, portions of the gateinsulating layer 224 corresponding to the LDD regions F of the first andthird active patterns 214 and 218 are exposed. Additionally, portions ofthe gate insulating layer 224 corresponding to the doped portions V2 ofthe second active pattern 216 are entirely exposed. The storage line 232has a reduced width.

Next, n⁻ ion doping is carried out on the entire surface of thesubstrate 200. Here, the first, second and third gate electrodes 226,228 and 230 are used as a doping mask. Thus, n-type ions are lightlydoped in the LDD portions F of the first and third active patterns 214and 218 and the doped portions V2 of the first, second and third activepatterns 214, 216 and 218. Since n-type ions are heavily doped in thedoped portions V2 of the first and third active patterns 214 and 218,n-type ions are more doped in the doped portions V2 of the first andthird active patterns 214 and 218 by the n⁻ ion doping. The fifth,sixth, seventh and eighth photoresist patterns 225 a, 225 b, 225 c and225 d are removed.

FIG. 36A is a cross-sectional view of the formation of a photoresistpattern in a driving region of an array substrate during a third maskprocess. FIG. 36B is a cross-sectional view illustrating the formationof a photoresist pattern in a pixel region of the array substrate duringthe third mask process. Referring to FIGS. 36A and 36B, photoresist iscoated on the entire surface of the substrate 200 where n⁻ ion doping isperformed. Then, the photoresist is patterned through a third maskprocess to thereby form a ninth photoresist pattern 236. The ninthphotoresist pattern 236 covers the first driving region A and the pixelregion P and exposes the second driving region B.

Subsequently, p⁺ ion doping is performed on the entire surface of thesubstrate 200 including the ninth photoresist pattern 236 thereon, andp-type ions are heavily doped in the doped portions V2 of the secondactive pattern 216. At this time, a concentration of the p-type ionsshould be about 2.5 times the concentration of the n-type ions in the n⁺ion doping. Therefore, although the n-type ions are doped in the dopedportions V2 of the second active pattern 216, there is no influence ofthe n-type ions because the concentration of the p-type ions is higherthan the concentration of the n-type ions. Accordingly, through thesecond and third mask processes, n-type ions are lightly doped in theLDD portions F of the first and the third active patterns 214 and 218;n-type ions are heavily doped in the doped portions V2 of the first andthird active patterns 214 and 218; and p-type ions are heavily doped inthe doped portions V2 of the second active pattern 216.

FIGS. 37A and 38A are cross-sectional views of the formation of aphotoresist pattern in a driving region of the array substrate during afourth mask process. FIGS. 37B and 38B are cross-sectional viewsillustrating the formation of a photoresist pattern in a pixel region ofthe array substrate during the fourth mask process. Referring to FIGS.37A and 37B, the ninth photoresist pattern 236 shown in FIGS. 36A and36B is removed. An inter insulating layer 238 and a transparentconductive layer 240 are sequentially formed on the entire surface ofthe substrate 200 where p⁺ ion doping is performed. The inter insulatinglayer 238 is formed of an inorganic insulating material, such as siliconnitride (SiN_(X)) or silicon oxide (SiO₂). The transparent conductivelayer 240 is formed of a transparent conductive material, such as indiumtin oxide (ITO) or indium zinc oxide (IZO).

A photoresist layer 242 is formed on the transparent conductive layer240 by coating a photoresist material. A mask M2 is disposed over thephotoresist layer 242. The mask M2 includes a transmitting portion H1, ablocking portion H2 and a half transmitting portion H3. The transmittingportion H1 corresponds to the doped portions V2 of the first, second andthird active patterns 214, 216 and 218. The blocking portion H2corresponds to the pixel region P, and the half transmitting portion H3corresponds to the other regions. The photoresist layer 242 is exposedto light through the mask M2 and developed. Accordingly, as illustratedin FIGS. 38A and 38B, tenth and eleventh photoresist patterns 246 and248 are formed. The tenth photoresist pattern 246 is disposed in thefirst driving region A, the second driving region B, and the switchingregion C, and exposes portions of the transparent conductive layer 240corresponding to the doped portions V2 of the first, second and thirdactive patterns 214, 216 and 218. The eleventh photoresist pattern 248is disposed in the pixel region P excluding the switching region C. Theeleventh photoresist pattern 248 is thicker than the tenth photoresistpattern 246.

FIG. 39A is a cross-sectional view of the formation of a plurality ofcontact holes in a driving region of the array substrate during thefourth mask process. FIG. 39B is a cross-sectional view illustrating theformation of a plurality of contact holes in a pixel region of the arraysubstrate during the fourth mask process. Referring to FIGS. 39A and39B, the exposed transparent conductive layer 240 and the underlyinglayers, including the inter insulating layer 238 and the gate insulatinglayer 224, are sequentially removed to thereby form first, second,third, fourth, fifth and sixth contact holes 249 a, 249 b, 249 c, 249 d,249 e and 249 f exposing the doped portions V2 of the first, second andthird active patterns 214, 216 and 218. Although not shown, a contacthole is also formed through the fourth mask process to expose the metalpattern 222.

Referring to FIGS. 40A and 40B, the tenth photoresist pattern 246 shownin FIGS. 39A and 39B is removed through an ashing process, and thetransparent conductive layer 240 of FIGS. 39A and 39B is exposed in thefirst driving region A, the second driving region B and the switchingregion C. At this time, the thickness of the eleventh photoresistpattern 248 is reduced, and an edge of the eleventh photoresist pattern248 is removed. Next, the exposed transparent conductive layer 240 ofFIGS. 39A and 39B is removed to thereby expose the inter insulatinglayer 238 in the first driving region A, the second driving region B andthe switching region C. Then, the eleventh photoresist pattern 248 isremoved, and the transparent conductive layer 240 in the pixel region Pbecomes a pixel electrode 240.

FIG. 41A is a cross-sectional view of the formation of a plurality ofelectrodes in a driving region of the array substrate during a fifthmask process. FIG. 41B is a cross-sectional view illustrating theformation of a plurality of electrodes in a pixel region of the arraysubstrate during the fifth mask process. Referring to FIGS. 41A and 41B,first source and drain electrodes 250 a and 250 b, second source anddrain electrodes 252 a and 252 b, and third source and drain electrodes254 a and 254 b are formed on the substrate 200 including the pixelelectrode 240 thereon by sequentially depositing and patterning ametallic material through a fifth mask process. The metallic materialincludes chromium (Cr), molybdenum (Mo), tungsten (W), titanium (Ti),aluminum (Al), an aluminum alloy such as AlNd, or copper (Cu). The firstsource and drain electrodes 250 a and 250 b contact the doped portionsV2 of the first active pattern 214 through the first and second contactholes 249 a and 249 b. The second source and drain electrodes 252 a and252 b contact the doped portions V2 of the second active pattern 216through the third and fourth contact holes 249 c and 249 d. The thirdsource and drain electrodes 254 a and 254 b contact the doped portionsV2 of the third active patterns 218 through the fifth and sixth contactholes 249 e and 249 f. The third drain electrode 254 b contacts thepixel electrode 240. Although not shown, the third drain electrode 254 balso contacts the metal pattern 222. Therefore, the metal pattern 222,the storage line 232 and the pixel electrode 240 function as first,second and third electrodes to form a storage capacitor C_(ST). Thestorage capacitor C_(ST) includes two parallel capacitors.

According to an other embodiment of the present invention, the arraysubstrate including driver ICs may be manufactured through five-maskprocesses. Thus, the reduced number of processes lowers occurrence ofproblems. Manufacturing time is shortened, and manufacturing costs arereduced. Additionally, productivity of the device is improved.

It will be apparent to those skilled in the art that variousmodifications and variations can be made in the array substrate forliquid crystal display device and the method of manufacturing the sameof the present invention without departing from the spirit or scope ofthe invention. Thus, it is intended that the present invention cover themodifications and variations of this invention provided they come withinthe scope of the appended claims and their equivalents.

1. An array substrate for a liquid crystal display device, comprising: asubstrate including a first driving region, a second driving region, anda pixel region, the pixel region including a switching region and astorage region; a first n-type transistor in the first driving region, asecond p-type transistor in the second driving region; a thirdtransistor in the switching region, the third transistor including agate electrode, an active layer, a source electrode, and a drainelectrode; an extension portion in the storage region and extending fromthe active layer; a metal pattern on the extension portion; a storageline over the metal pattern; and. a pixel electrode in the pixel regionand contacting the third transistor
 2. The array substrate according toclaim 1, wherein the metal pattern, the storage line and the pixelelectrode form first, second and third electrodes of a storagecapacitor, and wherein the storage capacitor includes a first capacitorand a second capacitor, the first capacitor parallel to the secondcapacitor.
 3. The array substrate according to claim 1, furthercomprising a gate line connected to the gate electrode and a data lineconnected to the source electrode.
 4. The array substrate according toclaim 1, wherein the active layer and the extension portion includepolycrystalline silicon.
 5. The array substrate according to claim 1,wherein the drain electrode electrically contacts the metal pattern andthe pixel electrode.
 6. The array substrate according to claim 2,wherein the first capacitor is formed by the metal pattern and thestorage line, and the second capacitor is formed by the storage line andthe pixel electrode.
 7. The array substrate according to claim 1,wherein the first n-type transistor and the third transistor in theswitching region have substantially the same structure.
 8. A method ofmanufacturing a liquid crystal display device, comprising: formingfirst, second and third active patterns, an extension portion and ametal pattern on a substrate using a first mask, the substrate having adriving region and a pixel region, the first and second active patternsin first and second driving regions of the driving region, the thirdactive pattern in a switching region of the pixel region, and theextension portion and the metal pattern in a storage region of the pixelregion; forming a gate insulating layer on the substrate including thefirst, second and third active patterns, the extension portion and themetal pattern; forming first, second and third gate electrodes and astorage line on the gate insulating layer using a second mask, thefirst, second and third gate electrodes corresponding to center portionsof the first, second and third active patterns, and the storage linedisposed over the metal pattern; substantially sequentially doping n⁺ions and n⁻ ions in the first and third active patterns using a thirdmask; doping p⁺ ions into the second active pattern using a fourth mask;forming an inter insulating layer and a transparent conductive layer onthe substrate including the p⁺ ion doped second active pattern;patterning the inter insulating layer and the transparent conductivelayer using a fifth mask to thereby expose portions of the first, secondand third active patterns and to form a pixel electrode in the pixelregion; and forming first source and drain electrodes, second source anddrain electrodes and third source and drain electrodes using a sixthmask, the first source and drain electrodes contacting the exposedportions of the first active pattern, the second source and drainelectrodes contacting the exposed portions of the second active pattern,and the third source and drain electrodes contacting the exposedportions of the third active pattern.
 9. The method according to claim8, wherein using the first mask includes: forming a polycrystallinesilicon layer on substantially an entire surface of the substrate;forming a metal layer on the polycrystalline silicon layer; forming aphotoresist layer on the metal layer; disposing a mask over thephotoresist layer, the mask including a transmitting portion, a blockingportion and a half transmitting portion; forming first, second, thirdand fourth photoresist patterns by substantially sequentially exposingthe photoresist layer to light through the mask and developing thephotoresist layer, the first, second, third and fourth photoresistpatterns corresponding to the first driving region, the second drivingregion, the switching region, and the storage region, the first, secondand third photoresist patterns being thinner than the fourth photoresistpattern; substantially selectively removing the metal layer and thepolycrystalline silicon layer by using the first, second, third andfourth photoresist patterns as an etching mask; removing the exposedmetal layer in the first driving region, the second driving region, andthe switching region; and removing the fourth photoresist pattern. 10.The method according to claim 9, further comprising removing the first,second and third photoresist patterns using an ashing process to exposethe metal layer in the first driving region, the second driving region,and the switching region prior to removing the exposed metal layer inthe first driving region, the second driving region and the switchingregion.
 11. The method according to claim 9, wherein the halftransmitting portion of the mask corresponds to the first, second andthird active patterns, and the blocking portion of the mask correspondsto the metal pattern.
 12. The method according to claim 8, wherein usingthe third mask includes: forming first, second and third photoresistpatterns in the first driving region, the second driving region and theswitching region, the first and third photoresist patterns partiallycovering the first and third active patterns, the second photoresistpattern entirely covering the second active pattern; doping n⁺ ions intothe first and third active patterns by using the first and thirdphotoresist patterns as a doping mask; removing the first, second andthird photoresist patterns; and doping n⁻ ions by using the first,second, and third gate electrodes as a doping mask to form light dopeddrain (LDD) portions in the first and third active patterns around thefirst and third gate electrodes.
 13. The method according to claim 8,wherein using the fifth mask includes: forming a photoresist layer onthe transparent conductive layer; disposing a mask over the photoresistlayer, the mask including a transmitting portion, a blocking portion anda half transmitting portion; forming first and second photoresistpatterns by exposing the photoresist layer to light through the mask andsubstantially subsequently developing the photoresist layer, the firstphotoresist pattern in the first driving region, the second drivingregion, and the switching region, and exposing portions of thetransparent conductive layer corresponding to the portions of the first,second and third active patterns, the second photoresist pattern in thepixel region excluding the switching region, the first photoresistpattern being thinner than the second photoresist pattern; selectivelyremoving the transparent conductive layer, the inter insulating layerand the gate insulating layer by using the first and second photoresistpatterns as an etching mask to thereby expose the portions of the first,second and third active patterns; removing the first photoresist patternto expose the selectively removed transparent conductive layer; removingthe exposed transparent conductive layer; and removing the secondphotoresist pattern.
 14. The method according to claim 8, wherein thethird drain electrode substantially electrically contacts the pixelelectrode.
 15. The method according to claim 8, further comprisingforming a gate line connected to the third gate electrode and a dataline connected to the third source electrode.
 16. The method accordingto claim 8, wherein the metal pattern, the storage line and the pixelelectrode form first, second and third electrodes of a storage capacitorthat includes two parallel capacitors.
 17. A method of manufacturing aliquid crystal display device, comprising: forming first, second andthird active patterns, an extension portion and a metal pattern on asubstrate using a first mask, the substrate having a first drivingregion, a second driving region, and a pixel region including aswitching region and a storage region, the first and second activepatterns in the first and second driving regions, the third activepattern in the switching region, and the extension portion and the metalpattern in the storage region; forming a gate insulating layer on thesubstrate including the first, second and third active patterns, theextension portion and the metal pattern; doping n⁺ ions and n⁻ ions inthe first and third active patterns and forming first, second and thirdgate electrodes and a storage line on the gate insulating layer using asecond mask, the first, second and third gate electrodes correspondingto center portions of the first, second and third active patterns, thestorage line over the metal pattern; doping p⁺ ions into the secondactive pattern using a third mask; forming an inter insulating layer anda transparent conductive layer on the substrate including the p⁺ iondoped second active pattern; patterning the inter insulating layer andthe transparent conductive layer using a fourth mask to expose portionsof the first, second and third active patterns and to form a pixelelectrode in the pixel region; and forming first source and drainelectrodes, second source and drain electrodes, and third source anddrain electrodes using a fifth mask, the first source and drainelectrodes contacting the exposed portions of the first active pattern,the second source and drain electrodes contacting the exposed portionsof the second active pattern, the third source and drain electrodescontacting the exposed portions of the third active pattern.
 18. Themethod according to claim 17, wherein using the first mask includes:forming a polycrystalline silicon layer on substantially an entiresurface of the substrate; forming a metal layer on the polycrystallinesilicon layer; forming a photoresist layer on the metal layer; disposinga mask over the photoresist layer, the mask including a transmittingportion, a blocking portion and a half transmitting portion; formingfirst, second, third and fourth photoresist patterns by exposing thephotoresist layer to light through the mask and then developing thephotoresist layer, the first, second, third and fourth photoresistpatterns corresponding to the first driving region, the second drivingregion, the switching region and the storage region, the first, secondand third photoresist patterns being thinner than the fourth photoresistpattern; removing the metal layer and the polycrystalline silicon layerusing the first, second, third and fourth photoresist patterns as anetching mask; removing the exposed metal layer in the first drivingregion, the second driving region and the switching region; and removingthe fourth photoresist pattern.
 19. The method according to claim 18,further comprising removing the first, second and third photoresistpatterns using an ashing process to thereby expose the metal layer inthe first driving region, the second driving region and the switchingregion prior to removing the exposed metal layer in the first drivingregion, the second driving region and the switching region.
 20. Themethod according to claim 18, wherein the half transmitting portion ofthe mask corresponds to the first, second and third active patterns, andthe blocking portion of the mask corresponds to the metal pattern. 21.The method according to claim 17, wherein using the second maskincludes: forming a metal layer on the gate insulating layer; formingfirst, second, third and fourth photoresist patterns on the metal layer,the first, second and third photoresist patterns corresponding to centerportions of the first, second and third active patterns, and the fourthphotoresist pattern entirely covering the metal pattern; selectivelyremoving the metal layer using the first, second, third and fourthphotoresist patterns as an etching mask; doping n⁺ ions on the substrateincluding the metal layer selectively removed by using the first,second, third and fourth photoresist patterns as a doping mask; removingedges of the first, second, third and fourth photoresist patterns andthe metal layer selectively removed to thereby form the first, secondand third gate electrodes and the storage line; doping n⁻ ions by usingthe first, second and third gate electrodes as a doping mask to formlight doped drain (LDD) portions in the first and third active patternsaround the first and third gate electrodes; and removing the first,second, third and fourth photoresist patterns to expose the first,second and third gate electrodes and the storage line.
 22. The methodaccording to claim 17, wherein the concentration of p⁺ ions is about 2.5times the concentration of n⁺ ions.
 23. The method according to claim17, wherein using the fourth mask includes: forming a photoresist layeron the transparent conductive layer; disposing a mask over thephotoresist layer, the mask including a transmitting portion, a blockingportion and a half transmitting portion; forming first and secondphotoresist patterns by exposing the photoresist layer to light throughthe mask and then developing the photoresist layer, the firstphotoresist pattern disposed in the first driving region, the seconddriving region, and the switching region and exposing the transparentconductive layer corresponding to the portions of the first, second andthird active patterns, the second photoresist pattern disposed in thepixel region excluding the switching region, and the first photoresistpattern being thinner than the second photoresist pattern; selectivelyremoving the transparent conductive layer, the inter insulating layerand the gate insulating layer using the first and second photoresistpatterns as an etching mask to thereby expose the portions of the first,second and third active patterns; removing the first photoresist patternto expose the transparent conductive layer selectively removed; removingthe exposed transparent conductive layer; and removing the secondphotoresist pattern.
 24. The method according to claim 17, wherein thethird drain electrode substantially electrically contacts the metalpattern and the pixel electrode.
 25. The method according to claim 17,further comprising forming a gate line connected to the third gateelectrode and a data line connected to the third source electrode. 26.The method according to claim 17, wherein the metal pattern, the storageline and the pixel electrode form first, second and third electrodes ofa storage capacitor that includes two parallel capacitors.